Archive for February, 2014

2nd Patent now granted in China

Feb 14, 2014

Smoltek’s ongoing investment in its patent portfolio has now resulted in the grant of a second patent in China.

8th strategic patent now granted in USA

August 13th, 2013 Smoltek is pleased to announce that its 8th patent now is granted in USA. This new patent is even further strengthening the IP protection of Smoltek’s disruptive technology that enables conductive nanostructures to be utilized for a wide range of applications in the semiconductor and electronics industry, supporting the next level miniaturization of semiconductor component packages.

Meet with us at the IPC Conference on Component Technology September 10-12

August 1st, 2013

Smoltek will participate in the upcoming IPC Conference on Component Technology: Closing the Gap in the Chip to PCB Process, September 10-12, 2013 at the Hilton, Chandler, AZ, USA.

Smoltek’s IP and technology truly supports the future needs of the Semicon Advanced Packaging industry by enabling significantly decreased Micro-bump pitch and size. The same basic technology also offers excellent characteristics when utlized as a Thermal Interface Material to improve heat dissipation from chip to package.

Meet up with us to learn more! IPC event website: IPC Conference on Component Technology

Plasma-Therm and Smoltek Commit to Carbon-Based Technology Development

June 11th, 2013

St. Petersburg, Florida, USA and Gothenburg, Sweden, June 11, 2013 – Plasma-Therm and Smoltek have entered a partnership to develop carbon-based growth and device technologies.

Carbon nanofibers (CNF) have been demonstrated as having applications for micro-bumps, enhanced thermal interface material and layer-to-layer micro-vias. Each of these applications addresses important needs in evolving semiconductor chip fabrication and packaging, provides specific advantages over existing technologies, and is CMOS-process compatible. New applications such as CNF-enhanced electrodes for supercapacitors, on-chip signal filtering capacitors, and antireflective films for optical uses are also emerging as the CNF technology develops.

Over the last 8 years Smoltek has built a strong IP portfolio available for licensing, providing a platform technology to enable controlled growth of substrate-based nanostructures and their related implementation in devices. By joining with Plasma-Therm, a leading semiconductor plasma processing equipment supplier, R&D efforts will accelerate, and more importantly, begin transferring the technology to an industrial platform.

Abdul Lateef, Plasma-Therm CEO, noted, “This relationship provides an important integration step that links fundamental material science and device-related structures with an accepted plasma processing platform.” He continued, “We are excited to make this investment and commitment in a technology that has such capability to change our industry.”

“Working closely at this stage with an equipment supplier is an industrial confirmation of our IPs and enables us to continue to secure development contracts with existing and new customers,” commented Anders Johansson, Smoltek CEO. Furthermore, he noted, “Our CNF-based technology has the potential to open our participation in a variety of very large markets. Having the appropriate processing hardware in this phase is highly valuable.”

About Smoltek

Established in 2006 in Gothenburg Sweden, Smoltek has focused on nanotechnology for the next generation of electronics and industrial products. Key to their vision is the implementation of carbon nanofibers for a variety of uses that demand smaller, faster, and cheaper solutions for advanced microelectronic circuits. Their IP portfolio covers core elements on how to control growth of substrate based nanostructures, their properties, and how to utilize such nanostructures for specific applications and devices. For further information, please visit

About Plasma-Therm

Established in 1974, Plasma-Therm is a U.S. manufacturer of advanced plasma-processing equipment, focusing on research and development systems to high-volume production in specialty semiconductor markets, including solid-state lighting, power, data storage, renewable energy, MEMS, nanotechnology, photonics, wireless communication and advanced photomask etching. Offering leading etching and deposition technologies and solutions for these markets, customers have recognized Plasma-Therm for the last 15 years for their products and service with VLSI research awards. Sales and service locations throughout North America, Europe and Asia Pacific meet the diverse needs of Plasma-Therm’s global base of over 600 customers. For further information, please visit

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