---
title: "Nanoimprint lithography using vertically aligned carbon nanostructures as stamp"
canonical_url: "https://www.smoltek.com/nanoimprint-lithography-using-vertically-aligned-carbon-nanostructures-as-stamp/975/"
date: 2009-08-26
author: "Thomas Barregren"
featured_image: "https://www.smoltek.com/wp-content/uploads/2021/12/2015-12-10-smoltek-16-jpg.webp"
categories:
  - name: "Research"
    url: "https://www.smoltek.com/category/research.md"
---

# Nanoimprint lithography using vertically aligned carbon nanostructures as stamp

Nanoim­print lith­o­g­ra­phy using ver­ti­cal­ly aligned car­bon nanos­truc­tures as stamps is report­ed. The func­tion­al­i­ty of the stamp is demon­strat­ed through lift-off and etch-back process­es after pat­tern repli­ca­tion. The imprint process is robust and the stamp struc­tures sur­vived more than 50 con­sec­u­tive imprints. In this paper we demon­strate this for fea­ture sizes rang­ing from 80 nm to 200 µm where the aspect ratio of the indi­vid­ual nanos­truc­tures sur­pass­es 1:5 with a pitch down to 100 nm. This demon­stra­tion opens up the pos­si­bil­i­ty of uti­liz­ing ver­ti­cal­ly grown car­bon nanos­truc­tures for man­u­fac­tur­ing extreme­ly high aspect ratio and small pitch stamps for nanoim­print lithography.

[Read more](https://iopscience.iop.org/article/10.1088/0957-4484/20/37/375302)