SmolNIL

Nano imprint lithography

SmolNIL™ is our nanoscale imprint technology that enables us to fabricate high aspect ratio (>1:10) imprint mold/mask with predefined shapes.

 

SmolNIL™ is Smoltek's patented technology concept for producing molds and masks with extremely high precision. The imprints are made of predefined carbon nanostructures that are ...

Pattern polymer layers

SmolNIL™ main benefits:

  • The arrays are suitable for transferring patterns from the template to another substrate by means of nanoimprint lithography. 

  • Using carbon nanostructures as a template Easy to control and opens up the possibility of using thicker resist layers 

  • Economically viable for mass production of templates 

  • Simple process

Patents

PatentNo
Area
CN102119363B
China
CN103154340B
China
2 630 281
Europe
321 032
India
JP540 55 74
Japan
MY-153444-A
Malaysia
12011500242
Philippines
KR101 638 463
South Korea
US 9 028 242
USA
US 7 687 876
USA
US 8 508 049
USA
US 7 777 291
USA
US 9 206 532
USA

White papers