Nano imprint lithography
SmolNIL™ is our nanoscale imprint technology that enables us to fabricate high aspect ratio (>1:10) imprint mold/mask with predefined shapes.
SmolNIL™ is Smoltek's patented technology concept for producing molds and masks with extremely high precision. The imprints are made of predefined carbon nanostructures that are ...
Pattern polymer layers
SmolNIL™ main benefits:
The arrays are suitable for transferring patterns from the template to another substrate by means of nanoimprint lithography.
Using carbon nanostructures as a template Easy to control and opens up the possibility of using thicker resist layers
Economically viable for mass production of templates