SmolNIL™ is our nanoscale imprint technology that enables us to fabricate high aspect ratio (>1:10) imprint mold/mask with predefined shapes.

 

SmolNIL™ is Smoltek's patented technology concept for producing molds and masks with extremely high precision. The imprints are made of predefined carbon nanostructures that are ...

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Pattern polymer layers

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SmolNIL™ main benefits:

• The arrays are suitable for transferring patterns from the template to another substrate by means of nanoimprint lithography. 

• Using carbon nanostructures as a template Easy to control and opens up the possibility of using thicker resist layers 

• Economically viable for mass production of templates 

• Simple process

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