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SmolNIL™
Nano imprint lithography
SmolNIL™ is our nanoscale imprint technology that enables us to fabricate high aspect ratio (>1:10) imprint mold/mask with predefined shapes.
SmolNIL™ is Smoltek's patented technology concept for producing molds and masks with extremely high precision. The imprints are made of predefined carbon nanostructures that are ...
Pattern polymer layers
SmolNIL™ main benefits:
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The arrays are suitable for transferring patterns from the template to another substrate by means of nanoimprint lithography.
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Using carbon nanostructures as a template Easy to control and opens up the possibility of using thicker resist layers
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Economically viable for mass production of templates
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Simple process
Out of gallery
Patents
PatentNo | Area |
---|---|
CN102119363B | China |
CN103154340B | China |
2 630 281 | Europe |
321 032 | India |
JP540 55 74 | Japan |
MY-153444-A | Malaysia |
12011500242 | Philippines |
KR101 638 463 | South Korea |
US 9 206 532 | USA |
US 9 028 242 | USA |
US 8 508 049 | USA |
US 7 687 876 | USA |
US 7 777 291 | USA |