SmolNIL

Nano imprint lithography

SmolNIL™ is our nanoscale imprint technology that enables us to fabricate high aspect ratio (>1:10) imprint mold/mask with predefined shapes.

 

SmolNIL™ is Smoltek's patented technology concept for producing molds and masks with extremely high precision. The imprints are made of predefined carbon nanostructures that are ...

Pattern polymer layers

SmolNIL™ main benefits:

  • The arrays are suitable for transferring patterns from the template to another substrate by means of nanoimprint lithography. 

  • Using carbon nanostructures as a template Easy to control and opens up the possibility of using thicker resist layers 

  • Economically viable for mass production of templates 

  • Simple process

Patents

White papers

Smoltek provides groundbreaking technology for the new wave of heterogeneous integration and advanced semiconductor packaging. 

By pioneering carbon nanotechnology we keep scaling advanced semiconductor packaging technologies on a system level.

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© 2005-2019 by Smoltek

Headquarters
Kaserntorget 7, S411 18 Gothenburg, Sweden

info@smoltek.com | +46 760 52 00 53

US location

470 Ramona Street, Palo Alto, CA 94301, USA

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