---
title: "Smoltek and ITRI Goes for Small Scale Production of CNF-MIM Capacitors"
canonical_url: "https://www.smoltek.com/smoltek-and-itri-goes-for-small-scale-production-of-cnf-mim-capacitors/8954/"
date: 2025-06-18
author: "Fredrik Liljeberg"
featured_image: "https://www.smoltek.com/wp-content/uploads/2024/12/2024-12-smoltek-at-itri-1.webp"
categories:
  - name: "News"
    url: "https://www.smoltek.com/category/news.md"
tags:
  - name: "atomic layer deposition"
    url: "https://www.smoltek.com/topic/atomic-layer-deposition.md"
  - name: "capacitors"
    url: "https://www.smoltek.com/topic/capacitors.md"
  - name: "cnf-mim"
    url: "https://www.smoltek.com/topic/cnf-mim.md"
  - name: "nanotechnology"
    url: "https://www.smoltek.com/topic/nanotechnology.md"
  - name: "news"
    url: "https://www.smoltek.com/topic/news.md"
  - name: "semi news"
    url: "https://www.smoltek.com/topic/semi-news.md"
  - name: "Smoltek Semi"
    url: "https://www.smoltek.com/topic/smoltek-semi.md"
---

# Smoltek and ITRI Goes for Small Scale Production of CNF-MIM Capacitors

The for­mal sign­ing process of the agree­ment, enabling low-vol­ume pro­duc­tion of Smoltek’s ultra-thin CNF-MIM capac­i­tors, is expect­ed to be com­plet­ed with­in days. As part of the col­lab­o­ra­tion, Smoltek will install and bring up its advanced CVD tool (car­bon nanofiber growth tool) at ITRI. This marks the begin­ning of the indus­tri­al­iza­tion of Smoltek’s tech­nol­o­gy for ultra-thin capac­i­tors aimed at advanced proces­sor chips.

> “The Tech­ni­cal Ser­vice Agree­ment allows us to accel­er­ate our roadmap and engage more close­ly with poten­tial cus­tomers who require ear­ly sam­ples of our high-per­for­mance, ultra-thin capacitors.” 
> 
> *Farzan Gha­vani­ni, CTO of Smoltek*

The tech­ni­cal ser­vice agree­ment ensures that Smoltek gains seam­less access to ITRI’s spe­cial­ized tech­ni­cal com­pe­tence and engi­neer­ing resources—an essen­tial step in prepar­ing for com­mer­cial deploy­ment. This arrange­ment allows the com­pa­ny to refine its process­es under indus­tri­al con­di­tions while lever­ag­ing ITRI’s semi­con­duc­tor R&D environment.

> “Smoltek’s inno­v­a­tive CNF-MIM capac­i­tor tech­nol­o­gy is high­ly rel­e­vant to the semi­con­duc­tor industry’s dri­ve for greater minia­tur­iza­tion and per­for­mance. By com­bin­ing our advanced R&D infra­struc­ture and engi­neer­ing exper­tise with Smoltek’s unique nan­otech­nol­o­gy, we aim to accel­er­ate the path toward indus­tri­al adoption.” 
> 
> *Dr. Arthur Lin, Divi­sion Direc­tor at ITRI’s Smart Sens­ing & Sys­tems Tech­nol­o­gy Center*

Fur­ther­more, the instal­la­tion and inte­gra­tion of Smoltek’s cus­tom-designed CVD tool at ITRI’s facil­i­ties enables a com­plete and seam­less fab­ri­ca­tion process to be car­ried out in one loca­tion. This inte­grat­ed set­up is a crit­i­cal enabler for small-scale pro­duc­tion, as it reduces logis­tics com­plex­i­ty, short­ens devel­op­ment cycles, and ensures tighter process control.

> “Hav­ing our advanced CVD tool on-site at ITRI gives us access to a com­plete val­ue chain—from mate­r­i­al growth to capac­i­tor integration—in a sin­gle loca­tion. This is a key mile­stone toward bring­ing our tech­nol­o­gy from lab to fab.”
> 
> *Mag­nus Ander­s­son, CEO of Smoltek*

Smoltek’s patent pro­tect­ed **CNF-MIM™ tech­nol­o­gy** enables the fab­ri­ca­tion of extreme­ly thin capac­i­tors with high capac­i­tance den­si­ty. These are ide­al­ly suit­ed for inte­gra­tion in the min­i­mal space beneath advanced proces­sor chips—an area where elec­tri­cal per­for­mance and form fac­tor are both crit­i­cal. This gives Smoltek’s tech­nol­o­gy a unique com­pet­i­tive advan­tage for next-gen­er­a­tion devices in mobile, AI, and high-per­for­mance com­put­ing markets.

* * *

Read the offi­cial press release here: [*Smoltek and ITRI Ini­ti­ate Tech­ni­cal Ser­vice Agree­ment for small scale pro­duc­tion of CNF-MIM Capac­i­tors*](https://news.cision.com/smoltek-nanotech-holding-ab/r/smoltek-and-itri-initiate-technical-service-agreement-for-small-scale-production-of-cnf-mim-capacito,c4166188).