---
title: "Substantial improvement in capacitance density for CNF-MIM"
canonical_url: "https://www.smoltek.com/substantial-improvement-in-capacitance-density-for-cnf-mim/1340/"
date: 2019-05-31
author: "Fredrik Liljeberg"
featured_image: "https://www.smoltek.com/wp-content/uploads/2021/12/e4e89e_905647a8198245d78eeedede9de9540fmv2-jpg.webp"
categories:
  - name: "News"
    url: "https://www.smoltek.com/category/news.md"
tags:
  - name: "cnf-mim"
    url: "https://www.smoltek.com/topic/cnf-mim.md"
  - name: "ectc"
    url: "https://www.smoltek.com/topic/ectc.md"
  - name: "nanotechnology"
    url: "https://www.smoltek.com/topic/nanotechnology.md"
  - name: "vincentdesmaris"
    url: "https://www.smoltek.com/topic/vincentdesmaris.md"
---

# Substantial improvement in capacitance density for CNF-MIM

The tech-team has worked real­ly hard with the devel­op­ment of our CNF-MIM capac­i­tor tech­nol­o­gy. And now at ECTC 2019 in Las Vegas, we can present the con­firmed results of that spe­cif­ic work.

Vin­cent, CTO at Smoltek says: “I am very pleased to have pre­sent­ed the lat­est results of our CNF-MIM tech­nol­o­gy at ECTC2019, which demon­strates capac­i­tance den­si­ties in excess of 350 nF/mm^2. It is impor­tant to expose our tech­nol­o­gy to the elec­tron­ics pack­ag­ing com­mu­ni­ty. This enables our tech­ni­cal team to syn­chro­nize the fur­ther opti­miza­tion of our CNF-MIM tech­nol­o­gy with the industry’s actu­al needs.”

Smoltek is con­tin­u­ous­ly in process of opti­miz­ing the con­cept design in order to make it more flex­i­ble and to address oth­er impor­tant para­me­ters like ESR and ESL of the CNF-MIM capac­i­tors. Fur­ther­more, the enhance­ment of CNF-MIM per­for­mance met­ri­ces are always con­firmed by more than one 3rd par­ty verifications.

Image: Vin­cent Des­maris, CTO at Smoltek