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The Contact Resistance patent family is covering how to improve a separator plate arrangement for an electrochemical cell by comprising a nanostructure which offers lowered contact resistance between the separator element and the diffusion layer.
V Desmaris, F Wenger, A M Saleem, E Passalacqua, M Bylund, R Andersson, V Marknäs • February 27, 2024
The InnoÂvaÂtion: An elecÂtrolyzÂer comÂprisÂing a first and a secÂond elecÂtrode and an ion exchange memÂbrane arranged in-between the first and the secÂond elecÂtrode is disÂclosed. Each elecÂtrode comÂprisÂes a conÂducÂtive eleÂment. At least one of the elecÂtrodes comÂprisÂes a catÂaÂlyst strucÂture, the catÂaÂlyst strucÂture comÂprisÂing a pluÂralÂiÂty of elonÂgatÂed nanosÂtrucÂtures arranged to conÂnect the conÂducÂtive eleÂment to a corÂreÂspondÂing pluÂralÂiÂty of catÂaÂlyst parÂtiÂcles. Each catÂaÂlyst parÂtiÂcle is localÂized at the end of a respecÂtive elonÂgatÂed nanosÂtrucÂture oppoÂsite from the conÂducÂtive element.
Patent Office | Patent |
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SweÂden | SE 545 845 C2 |
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