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Contact Resistance
The Contact Resistance patent family is covering how to improve a separator plate arrangement for an electrochemical cell by comprising a nanostructure which offers lowered contact resistance between the separator element and the diffusion layer.
The Innovation: An electrolyzer comprising a first and a second electrode and an ion exchange membrane arranged in-between the first and the second electrode is disclosed. Each electrode comprises a conductive element. At least one of the electrodes comprises a catalyst structure, the catalyst structure comprising a plurality of elongated nanostructures arranged to connect the conductive element to a corresponding plurality of catalyst particles. Each catalyst particle is localized at the end of a respective elongated nanostructure opposite from the conductive element.
Granted patents relating to the innovation
| Patent Office | Patent |
|---|---|
| Sweden | SE 545845 C2 |
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