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Us9028242.pdf

Nano Imprint Lithography

The Nano Imprint Lithography family is covering a method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures.

A M Saleem, D Brud, J Berg, S Kabir, V Desmaris • July 23, 2009

The inven­tion: A tem­plate and method of mak­ing high aspect ratio tem­plate, stamp, and imprint­ing at nanoscale using nanos­truc­tures for the pur­pose of lith­o­g­ra­phy, and to the use of the tem­plate to cre­ate per­fo­ra­tions on mate­ri­als and products.

Down­load the patent grant­ed by USPTO.

Granted patents relating to the innovation

Patent OfficePatent
Chi­naCN102119363
JapanJP5405574
MalaysiaMY153444
Philip­pinesPH12011500242
USAUS9028242
For more infor­ma­tion about a par­tic­u­lar patent, click on its name to view it on Google Patents.

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