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The Nano Imprint Lithography family is covering a method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures.
A M Saleem, D Brud, J Berg, S Kabir, V Desmaris • July 23, 2009
The invenÂtion: A temÂplate and method of makÂing high aspect ratio temÂplate, stamp, and imprintÂing at nanoscale using nanosÂtrucÂtures for the purÂpose of lithÂoÂgÂraÂphy, and to the use of the temÂplate to creÂate perÂfoÂraÂtions on mateÂriÂals and products.
Patent Office | Patent |
---|---|
ChiÂna | CN102119363 |
Japan | JP5405574 |
Malaysia | MY153444 |
PhilipÂpines | PH12011500242 |
USA | US9028242 |
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