Nanoimprint lithography using vertically aligned carbon nanostructures as stamp

Nanoim­print lith­o­g­ra­phy using ver­ti­cal­ly aligned car­bon nanos­truc­tures as stamps is report­ed. The func­tion­al­i­ty of the stamp is demon­strat­ed through lift-off and etch-back process­es after pat­tern repli­ca­tion. The imprint process is robust and the stamp struc­tures sur­vived more than 50 con­sec­u­tive imprints. In this paper we demon­strate this for fea­ture sizes rang­ing from 80 nm to 200 µm where the aspect ratio of the indi­vid­ual nanos­truc­tures sur­pass­es 1:5 with a pitch down to 100 nm. This demon­stra­tion opens up the pos­si­bil­i­ty of uti­liz­ing ver­ti­cal­ly grown car­bon nanos­truc­tures for man­u­fac­tur­ing extreme­ly high aspect ratio and small pitch stamps for nanoim­print lithography.