Nanoimprint lithography using vertically aligned carbon nanostructures as stamps is reported. The functionality of the stamp is demonstrated through lift-off and etch-back processes after pattern replication. The imprint process is robust and the stamp structures survived more than 50 consecutive imprints. In this paper we demonstrate this for feature sizes ranging from 80 nm to 200 µm where the aspect ratio of the individual nanostructures surpasses 1:5 with a pitch down to 100 nm. This demonstration opens up the possibility of utilizing vertically grown carbon nanostructures for manufacturing extremely high aspect ratio and small pitch stamps for nanoimprint lithography.
Carbon nanofibers is a supermaterial. It is stronger, more elastic, and lighter than steel. It conducts heat and electricity better than metals. And it can be used to thousandfold the surface of materials. Let’s take a closer look at these tiny fellows. What is a carbon nanofiber (CNF)? A carbon nanofiber (CNF) is a carbon-made material so thin that...
Smoltek holds unique world patents for technologies that make material engineering on an atomic level possible. Smoltek has solutions that allow continued miniaturization and increased performance of semiconductors, contribute to carbon-free steel production and renewable energy storage, and enable mind control of robotic prostheses. This is a story of how Smoltek came to be.
This is the third and last article in a series of three in which Smoltek founder and strategic advisor Shafiq Kabir share his personal thoughts on nanotechnology opportunities. In the previous two articles, he has addressed both the hype and the reality of carbon nanotechnology. In this last article, he looks into the future. He discusses how carbon nanotechnology will unleash the power of the internet of everything.