Sign up for our newsletter!
Your data will be handled in compliance with our privacy policy.
Your data will be handled in compliance with our privacy policy.
Smoltek Semi has developed a new process, known as zapping, that reduces the number of steps required to manufacture test capacitors.
The new zapÂping method cuts the time to manÂuÂfacÂture test capacÂiÂtors from nearÂly a month to just one week. The faster manÂuÂfacÂturÂing process enables Smoltek’s researchers to conÂduct more experÂiÂments that accelÂerÂate major techÂnolÂoÂgy advances – makÂing the CNF-MIM techÂnolÂoÂgy more attracÂtive to potenÂtial buyers.
By cutÂting the develÂopÂment time so draÂmatÂiÂcalÂly, we can iterÂate faster and focus more on optiÂmizÂing perÂforÂmance. This effiÂcienÂcy allows us to explore new conÂfigÂuÂraÂtions and achieve breakÂthroughs much soonÂer, which strengthÂens our posiÂtion when engagÂing with potenÂtial buyÂers.
Farzan GhaÂvaniÂni, CTO at Smoltek.
The new method, called zapÂping, is excluÂsiveÂly used durÂing the develÂopÂment phase to expeÂdite testÂing. It enables researchers to quickÂly evalÂuÂate new conÂfigÂuÂraÂtions and mateÂriÂals using simÂpliÂfied test capacÂiÂtors, savÂing valuÂable time and resources.
ZapÂping is a clear advanÂtage for us and our shareÂholdÂers. Faster develÂopÂment cycles mean shortÂer time to marÂket for breakÂthroughs, like tripling capacÂiÂtance denÂsiÂty and halvÂing leakÂage current.
Farzan GhaÂvaniÂni
ZapÂping, explained:
The zapÂping method involves briefly applyÂing a high voltÂage across speÂcifÂic conÂtact points on a test capacÂiÂtor, creÂatÂing a conÂtrolled breakÂdown in the insuÂlatÂing layÂer. This techÂnique elimÂiÂnates the need for mulÂtiÂple comÂplex etchÂing steps, sigÂnifÂiÂcantÂly streamÂlinÂing the testÂing process.
For a more detailed explaÂnaÂtion of the zapÂping method and its impact on Smoltek’s capacÂiÂtor techÂnolÂoÂgy develÂopÂment, please visÂit the comÂpaÂny’s IR blog.
Your data will be handled in compliance with our privacy policy.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.