Göte­borg-based nan­otech­nol­o­gy com­pa­ny Smoltek has achieved a sig­nif­i­cant tech­ni­cal mile­stone by man­u­fac­tur­ing a CNF-MIM capac­i­tor with a capac­i­tance of 1 micro­farad per square mil­lime­ter. This break­through was accom­plished through col­lab­o­ra­tion between sub­sidiary Smoltek Semi and Tai­wanese part­ner Skytech, uti­liz­ing advanced Atom­ic Lay­er Depo­si­tion (ALD) equipment.

The devel­op­ment work, ini­ti­at­ed ear­li­er this year, focused on opti­miz­ing ALD films deposit­ed on Smoltek’s pro­pri­etary CNF-MIM test capac­i­tor struc­tures. The dielec­tric stack incor­po­rates zir­co­ni­um oxide and alu­minum oxide, achiev­ing an active lay­er thick­ness of 6 μm and a vol­u­met­ric capac­i­tance den­si­ty exceed­ing 160 nF/mm²-μm—among the high­est report­ed for ultra-thin capac­i­tors in the industry.

Con­cur­rent with this tech­ni­cal achieve­ment, Smoltek announced a rights issue tar­get­ing 26–32 mil­lion SEK, with a sub­scrip­tion peri­od from June 9–24, 2025. The fund­ing will sup­port ongo­ing dia­logues with indus­tri­al part­ners for tech­nol­o­gy com­mer­cial­iza­tion, main­tain R&D momen­tum across sub­sidiaries, and pro­vide work­ing capital.

Addi­tion­al­ly, Smoltek Hydro­gen has advanced its PTE (Porous Trans­port Elec­trode) tech­nol­o­gy, designed to enhance cat­alyt­ic activ­i­ty while sig­nif­i­cant­ly reduc­ing pre­cious met­al usage, includ­ing irid­i­um and plat­inum, in elec­trolyz­er cells.