Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Tem­plate and method of mak­ing high aspect ratio tem­plate, stamp, and imprint­ing at nanoscale using nanos­truc­tures for the pur­pose of lith­o­g­ra­phy, and to the use of the tem­plate to cre­ate per­fo­ra­tions on mate­ri­als and products.

Granted patents relating to the innovation

Patent OfficePatent
Chi­naCN102119363
JapanJP5405574
MalaysiaMY153444
Philip­pinesPH12011500242
USAUS9028242
For more infor­ma­tion about a par­tic­u­lar patent, click on its name to view it on Google Patents.

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