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The inven­tion: A tem­plate and meth­od of mak­ing high aspect ratio tem­plate, stamp, and imprint­ing at nano­scale using nano­struc­tures for the pur­pose of litho­graphy, and to the use of the tem­plate to cre­ate per­for­a­tions on mater­i­als and products.

Granted patents relating to the innovation

Pat­ent OfficePat­ent
ChinaCN102119363
JapanJP5405574
Malay­siaMY153444
Phil­ip­pinesPH12011500242
USAUS9028242
For more inform­a­tion about a par­tic­u­lar pat­ent, click on its name to view it on Google Patents.

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