The new Chi­nese patent strength­ens the posi­tion of our helplay­er patent fam­i­ly towards form­ing of nanos­truc­ture devices. The method cov­ers dif­fer­ent types of nanos­truc­tures includ­ing car­bon nan­otubes, nanofibers, nanowires etc.

“Anoth­er con­fir­ma­tion of our unique nanos­truc­ture growth plat­form tech­nol­o­gy that enables man­u­fac­tur­ing of nano­ma­te­r­i­al devices on CMOS plat­form. We are hum­bled to see that our IP foot­print is con­stant­ly strength­en­ing in Chi­na, one of the main hubs for semi­con­duc­tor man­u­fac­tur­ing”, says Dr. M. Shafiq Kabir, Smoltek´s CIO.

Smoltek’s patent port­fo­lio now glob­al­ly com­pris­es 49 grant­ed patents.