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Ep2630281b1.pdf

Catalyst Diffusion

The Catalyst Diffusion family is covering a method for manufacturing a plurality of nanostructures on a substrate.

The invention: Nanostructure device and method for manufacturing nanostructures – A method for manufacturing a plurality of nanostructures on a substrate. The method comprises the steps of: depositing a bottom layer on an upper surface of the substrate, the bottom layer comprising grains having a first average grain size; depositing a catalyst layer on an upper surface of the bottom layer, the catalyst layer comprising grains having a second average grain size different from the first average grain size, thereby forming a stack of layers comprising the bottom layer and the catalyst layer; heating the stack of layers to a temperature where nanostructures can form; and providing a gas comprising a reactant such that the reactant comes into contact with the catalyst layer.

Granted patents relating to the innovation

Patent OfficePatent
ChinaCN103154340
EuropeEP2630281
IndiaIN347659
RussiaRU2573474
South KoreaKR101736303
South KoreaKR101903714
South KoreaKR101970209
USAUS9206532
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