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The Catalyst Diffusion family is covering a method for manufacturing a plurality of nanostructures on a substrate.
A M Saleem, D Brud, J Berg, S Kabir, V Desmaris • October 18, 2010
The invenÂtion: NanosÂtrucÂture device and method for manÂuÂfacÂturÂing nanosÂtrucÂtures – A method for manÂuÂfacÂturÂing a pluÂralÂiÂty of nanosÂtrucÂtures on a subÂstrate. The method comÂprisÂes the steps of: depositÂing a botÂtom layÂer on an upper surÂface of the subÂstrate, the botÂtom layÂer comÂprisÂing grains havÂing a first averÂage grain size; depositÂing a catÂaÂlyst layÂer on an upper surÂface of the botÂtom layÂer, the catÂaÂlyst layÂer comÂprisÂing grains havÂing a secÂond averÂage grain size difÂferÂent from the first averÂage grain size, thereÂby formÂing a stack of layÂers comÂprisÂing the botÂtom layÂer and the catÂaÂlyst layÂer; heatÂing the stack of layÂers to a temÂperÂaÂture where nanosÂtrucÂtures can form; and proÂvidÂing a gas comÂprisÂing a reacÂtant such that the reacÂtant comes into conÂtact with the catÂaÂlyst layer.
| Patent Office | Patent |
|---|---|
| ChiÂna | CN103154340 |
| Europe | EP2630281 |
| India | IN347659 |
| RusÂsia | RU2573474 |
| South Korea | KR101736303 |
| South Korea | KR101903714 |
| South Korea | KR101970209 |
| USA | US9206532 |
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