Catalyst Diffusion

The invention: Nanostructure device and method for manufacturing nanostructures – A method for manufacturing a plurality of nanostructures on a substrate. The method comprises the steps of: depositing a bottom layer on an upper surface of the substrate, the bottom layer comprising grains having a first average grain size; depositing a catalyst layer on an upper surface of the bottom layer, the catalyst layer comprising grains having a second average grain size different from the first average grain size, thereby forming a stack of layers comprising the bottom layer and the catalyst layer; heating the stack of layers to a temperature where nanostructures can form; and providing a gas comprising a reactant such that the reactant comes into contact with the catalyst layer.

Granted patents relating to the innovation

Patent Office	Patent
China	CN103154340
Europe	EP2630281
India	IN347659
Russia	RU2573474
South Korea	KR101736303
South Korea	KR101903714
South Korea	KR101970209
USA	US9206532