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The Helplayer family is covering a method to protect the underlaying substrate or materials from being damaged during the nanostructure growth process.
J Berg, V Desmaris, S Kabir, D Brud • February 20, 2009
The invenÂtion: A method for makÂing one or more nanosÂtrucÂtures is disÂclosed, the method comÂprisÂing: depositÂing a conÂductÂing layÂer on an upper surÂface of a subÂstrate; depositÂing a patÂterned layÂer of catÂaÂlyst on the conÂductÂing layÂer; growÂing the one or more nanosÂtrucÂtures on the layÂer of catÂaÂlyst; and selecÂtiveÂly removÂing the conÂductÂing layÂer between and around the one or more nanosÂtrucÂtures. A device is also disÂclosed, comÂprisÂing a subÂstrate, whereÂin the subÂstrate comÂprisÂes one or more exposed metÂal islands sepÂaÂratÂed by one or more insuÂlatÂing areas; a conÂductÂing helplayÂer disÂposed on the subÂstrate covÂerÂing at least some of the one or more exposed metÂal islands or insuÂlatÂing areas; a catÂaÂlyst layÂer disÂposed on the conÂductÂing helplayÂer; and one or more nanosÂtrucÂtures disÂposed on the catÂaÂlyst layer.
| Patent Office | Patent |
|---|---|
| ChiÂna | CN102007571 |
| ChiÂna | CN105441903 |
| Europe | EP2250661 |
| India | IN327303 |
| Japan | JP5474835 |
| Japan | JP5943947 |
| Japan | JP6126725 |
| South Korea | KR101638463 |
| TaiÂwan | TWI465389 |
| USA | US8508049 |
| USA | US8866307 |
| USA | US9114993 |
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