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Substantial improvement in capacitance density for CNF-MIM

At the annual IEEE Electronic Component and Technology Conference 2019 Smoltek presented new and improved measurement data for the CNF-MIM capacitance density – now in the range over 350nF/mm^2.

May 31, 2019

The tech-team has worked really hard with the devel­op­ment of our CNF-MIM capa­cit­or tech­no­logy. And now at ECTC 2019 in Las Vegas, we can present the con­firmed res­ults of that spe­cif­ic work.

Vin­cent, CTO at Smol­tek says: “I am very pleased to have presen­ted the latest res­ults of our CNF-MIM tech­no­logy at ECTC2019, which demon­strates capa­cit­ance dens­it­ies in excess of 350 nF/mm^2. It is import­ant to expose our tech­no­logy to the elec­tron­ics pack­aging com­munity. This enables our tech­nic­al team to syn­chron­ize the fur­ther optim­iz­a­tion of our CNF-MIM tech­no­logy with the industry’s actu­al needs.”

Smol­tek is con­tinu­ously in pro­cess of optim­iz­ing the concept design in order to make it more flex­ible and to address oth­er import­ant para­met­ers like ESR and ESL of the CNF-MIM capa­cit­ors. Fur­ther­more, the enhance­ment of CNF-MIM per­form­ance met­rices are always con­firmed by more than one 3rd party verifications.

Image: Vin­cent Des­mar­is, CTO at Smoltek

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