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Dr. Farzan Ghavanini, CTO of Smoltek has been on a week-long business trip to Taiwan to visit some of our collaboration partners for CNF-MIM capacitors, among those ALD-company Skytech.
AtomÂic LayÂer DepoÂsiÂtion (ALD) is a key proÂcessÂing step in conÂvertÂing the excepÂtionÂal surÂface to volÂume ratio offered by carÂbon nanofibers to a high capacÂiÂtance denÂsiÂty CNF-MIM capacitor.
Skytech proÂduces some of the best-in-class ALD tools that offer extreme uniÂforÂmiÂty and film qualÂiÂty over 3D strucÂtures. These qualÂiÂties are vital for Smoltek’s CNF-MIM techÂnolÂoÂgy where high aspect ratio nanofibers must be conÂforÂmalÂly coatÂed with a thin dielecÂtric film.
Farzan GhaÂvaniÂni, CTO at Smoltek
DurÂing the busiÂness trip to TaiÂwan, Dr. Farzan GhaÂvaniÂni sat with Skytech CEO, George Yi, to disÂcuss future colÂlabÂoÂraÂtions and how to inteÂgrate Skytech’s ALD clusÂter tools in CNF-MIM capacÂiÂtor fabÂriÂcaÂtion process flow.
About Skytech
Skytech is a TaiÂwanese comÂpaÂny, based in Hsinchu, that proÂduces state-of-the-art ALD tools, offerÂing excepÂtionÂal film uniÂforÂmiÂty, thickÂness conÂtrol, and mateÂrÂiÂal properties.
PeoÂple picÂtured in the top phoÂto: Farzan GhaÂvaniÂni from Smoltek togethÂer with George Li and co-workÂer from Skytech.
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News
November 5, 2025
Smoltek Semi has reached an important technical milestone in the development of the company’s carbon fiber-based CNF-MIM technology. The capacitors have successfully passed a 1,000-hour high-temperature durability test, confirming the robustness of the technology for advanced applications.
News
October 24, 2025
Smoltek Semi has acquired a plasma-enhanced Atomic Layer Deposition (ALD) system to implement its advanced dielectric stack on carbon nanofibers. The system will significantly reduce the iteration time of coating processes while enabling innovation and IP generation in dielectric stack technology for carbon nanofiber electrodes.
News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.