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Smoltek has yet another granted patent to add to its extensive IP portfolio. In November 2018 the Chinese patent office has issued the Letter of grant of the divisional patent application.
The granted patent covers different aspects of application of nanostructures in the field of interconnecting two adjacent layers which in this case may for example be two silicon chips (die) for electronic packaging purposes.
“We are witnessing the expansion of our patent portfolio towards different applications of our nanostructure technology. This particular patent is strengthening our position within the advanced packaging segment for integrated circuits with higher performance at a smaller footprint”, says Dr. M. Shafiq Kabir, Smoltek´s CIO.
Smoltek’s patent portfolio now globally comprises 51 granted patents. Read more about our IP and patents here.
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News
October 24, 2025
Smoltek Semi has acquired a plasma-enhanced Atomic Layer Deposition (ALD) system to implement its advanced dielectric stack on carbon nanofibers. The system will significantly reduce the iteration time of coating processes while enabling innovation and IP generation in dielectric stack technology for carbon nanofiber electrodes.
News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.