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Smoltek practically doubles the capacitance density for CNF-MIM – again

A year ago, the capacitance density for the CNF-MIM capacitor technology was at 200 nF/mm^2. In May this year it had risen to 350. And now we nearly have doubled that to +650 nF/mm^2!

September 20, 2019

“I am excited to have presen­ted the latest res­ults obtained by our team on our CNF-MIM tech­no­logy at SEMICON Taiwan. The CNF-MIM tech­no­logy now offers capa­cit­ance dens­it­ies in excess of 650 nF/mm^2 at robust tem­per­at­ure and voltage per­form­ance. This is more or less a doub­ling of the capa­cit­ance dens­ity per­form­ance that was presen­ted at ECTC 2019 earli­er this year.”, says Vin­cent Des­mar­is, CTO at Smoltek.

For Smol­tek it is import­ant to expose our tech­no­logy to the semi­con­duct­or and elec­tron­ics indus­tries. SEMICON Taiwan is a great event for such expos­ure. Indus­tri­al inter­ac­tion is cru­cial for us to syn­chron­ize our R&D efforts with the actu­al needs, to ulti­mately sup­port the adap­tion of our dis­rupt­ive CNF-MIM technology.

Image: Vin­cent Des­mar­is, CTO at Smoltek

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