Smoltek practically doubles the capacitance density for CNF-MIM – again

A year ago, the capac­i­tance den­si­ty for the CNF-MIM capac­i­tor tech­nol­o­gy was at 200 nF/mm^2. In May this year it had risen to 350. And now we near­ly have dou­bled that to +650 nF/mm^2!

“I am excit­ed to have pre­sent­ed the lat­est results obtained by our team on our CNF-MIM tech­nol­o­gy at SEMICON Tai­wan. The CNF-MIM tech­nol­o­gy now offers capac­i­tance den­si­ties in excess of 650 nF/mm^2 at robust tem­per­a­ture and volt­age per­for­mance. This is more or less a dou­bling of the capac­i­tance den­si­ty per­for­mance that was pre­sent­ed at ECTC 2019 ear­li­er this year.”, says Vin­cent Des­maris, CTO at Smoltek.

For Smoltek it is impor­tant to expose our tech­nol­o­gy to the semi­con­duc­tor and elec­tron­ics indus­tries. SEMICON Tai­wan is a great event for such expo­sure. Indus­tri­al inter­ac­tion is cru­cial for us to syn­chro­nize our R&D efforts with the actu­al needs, to ulti­mate­ly sup­port the adap­tion of our dis­rup­tive CNF-MIM technology.

Image: Vin­cent Des­maris, CTO at Smoltek

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