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Smoltek attended the international IEEE EDAPS conference for the first time come this last December. Besides presenting new and improved data for the CNF-MIM technology Vincent Desmaris also won the title ‘Best Oral Paper Award’.
The EDAPS symposium consists of technical paper presentation, poster sessions, industry exhibits, workshops and tutorials. Designers, engineers and researchers across the world come forth to share and discuss their work on all aspects of electrical signal integrity including modeling, design and simulation, fabrication, characterization and packaging.
At the conference, Vincent Desmaris, CTO of Smoltek, presented the Smoltek paper: “Ultra Thin Capacitors based on Carbon nanofibers with Ultra High Capacitance Density,” in which he said:
“We are taking the opportunity to present the latest achievements of our CNF-MIM technology, emphasizing our latest technological development. The CNF-MIM electrical data now feature an equivalent series resistance (ESR) of about 40 mΩ, which represents more than a twofold improvement compared to data released at SEMICON Taiwan 2019. This technological step also put us on a par with the other competing technologies when it comes to electrical data but at a fraction of their volume.”
At the closing ceremony of the conference Vincent’s presentation was awarded ‘Best Oral Paper’-presentation. However, by then the Smoltek team had already left the conference for business meetings in Taiwan. In fact, it wasn’t until yesterday, when Vincent received an e‑mail from the EDAPS 2019 secretariat informing him on the award, that we became aware of the achievement.
Still, late news can be good news.
Image: Vincent Desmaris, CTO at Smoltek
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News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.
News
April 28, 2025
Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
News
March 25, 2025
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.