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Smoltek attended the international IEEE EDAPS conference for the first time come this last December. Besides presenting new and improved data for the CNF-MIM technology Vincent Desmaris also won the title ‘Best Oral Paper Award’.
The EDAPS symposium consists of technical paper presentation, poster sessions, industry exhibits, workshops and tutorials. Designers, engineers and researchers across the world come forth to share and discuss their work on all aspects of electrical signal integrity including modeling, design and simulation, fabrication, characterization and packaging.
At the conference, Vincent Desmaris, CTO of Smoltek, presented the Smoltek paper: “Ultra Thin Capacitors based on Carbon nanofibers with Ultra High Capacitance Density,” in which he said:
“We are taking the opportunity to present the latest achievements of our CNF-MIM technology, emphasizing our latest technological development. The CNF-MIM electrical data now feature an equivalent series resistance (ESR) of about 40 mΩ, which represents more than a twofold improvement compared to data released at SEMICON Taiwan 2019. This technological step also put us on a par with the other competing technologies when it comes to electrical data but at a fraction of their volume.”
At the closing ceremony of the conference Vincent’s presentation was awarded ‘Best Oral Paper’-presentation. However, by then the Smoltek team had already left the conference for business meetings in Taiwan. In fact, it wasn’t until yesterday, when Vincent received an e‑mail from the EDAPS 2019 secretariat informing him on the award, that we became aware of the achievement.
Still, late news can be good news.
Image: Vincent Desmaris, CTO at Smoltek
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News
November 5, 2025
Smoltek Semi has reached an important technical milestone in the development of the company’s carbon fiber-based CNF-MIM technology. The capacitors have successfully passed a 1,000-hour high-temperature durability test, confirming the robustness of the technology for advanced applications.
News
October 24, 2025
Smoltek Semi has acquired a plasma-enhanced Atomic Layer Deposition (ALD) system to implement its advanced dielectric stack on carbon nanofibers. The system will significantly reduce the iteration time of coating processes while enabling innovation and IP generation in dielectric stack technology for carbon nanofiber electrodes.
News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.