Substantial improvement in capacitance density for CNF-MIM

At the annu­al IEEE Elec­tron­ic Com­po­nent and Tech­nol­o­gy Con­fer­ence 2019 Smoltek pre­sent­ed new and improved mea­sure­ment data for the CNF-MIM capac­i­tance den­si­ty – now in the range over 350nF/mm^2.

The tech-team has worked real­ly hard with the devel­op­ment of our CNF-MIM capac­i­tor tech­nol­o­gy. And now at ECTC 2019 in Las Vegas, we can present the con­firmed results of that spe­cif­ic work.

Vin­cent, CTO at Smoltek says: “I am very pleased to have pre­sent­ed the lat­est results of our CNF-MIM tech­nol­o­gy at ECTC2019, which demon­strates capac­i­tance den­si­ties in excess of 350 nF/mm^2. It is impor­tant to expose our tech­nol­o­gy to the elec­tron­ics pack­ag­ing com­mu­ni­ty. This enables our tech­ni­cal team to syn­chro­nize the fur­ther opti­miza­tion of our CNF-MIM tech­nol­o­gy with the industry’s actu­al needs.”

Smoltek is con­tin­u­ous­ly in process of opti­miz­ing the con­cept design in order to make it more flex­i­ble and to address oth­er impor­tant para­me­ters like ESR and ESL of the CNF-MIM capac­i­tors. Fur­ther­more, the enhance­ment of CNF-MIM per­for­mance met­ri­ces are always con­firmed by more than one 3rd par­ty verifications.

Image: Vin­cent Des­maris, CTO at Smoltek

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