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The ultra-thin capacitor market is entering a new phase as major players like Murata and Samsung invest heavily in silicon-based solutions. In a recent interview, YAGEO Group's CTO Philip Lessner explains why Smoltek's CNF-MIM technology could offer superior advantages to silicon-based solutions in this rapidly growing market.
Smoltek Semi has developed a new process, known as zapping, that reduces the number of steps required to manufacture test capacitors.
Our innovative “zapping” method drastically reduces development time and costs, enabling us to advance CNF-MIM technology faster and making Smoltek Semi’s technology even more attractive to potential buyers. Read on to see how this new process strengthens our position and shortens our path to market.
Smoltek Semi has developed a new material for use in CNF-MIM capacitors. The new material increases capacitance by more than three times and reduces leakage current by 50 percent. In this article, we examine what this means and why it is good for shareholders and investors.
Smoltek Semi has spent the last nine months working intensively on a project to develop a new dielectric stack for the CNF-MIM capacitor technology resulting in a 230% boost in capacitance density.
Smoltek has been awarded a new patent in the Discrete CNF-MIM patent family. The protected innovation in this patent family discloses a discrete capacitor component based on our CNF-MIM technology. This also brings our IP portfolio to comprise 91 granted patents.
Smoltek's CNF-MIM technology offers a competitive alternative to silicon capacitors for ultra-thin high-performance capacitors used in processors for mobile phones and computers. The next-generation capacitors, Gen-One, is planned to be completed by the end of 2024, matching competitors in performance with an exceptionally thin form factor. The strategic objective is to pair up with a financially strong partner for the industrialization and commercialization of the capacitors.
The Multilayer Cap patent family introduces a MIM-capacitor device that can double or triple the capacitance density of Smoltek's CNF-MIM capacitors. The patent details an invention for a layered energy storage device, specifically a capacitor, built using a metal-insulator-metal (MIM) configuration.
Smoltek has received a new patent for improving the capacitance density of our CNF-MIM capacitors. This innovation, a type of capacitor, can increase the capacitance density by two to three times, which is crucial for Smoltek's business and technology growth.
Interview with Philip Lessner, CTO of Yageo Group about the future of the capacitor industry, the market and technology needs for ultra-thin capacitors. And how CNF-MIM technology fits into this market.
This is a follow-up to last year's interview, about how the two companies were a perfect fit. Yageo remains interested in Smoltek's CNF-MIM capacitors and sees great potential for using CNF-MIM capacitors now and in the future.
Note: Extended version (15:54 mins) available on https://youtu.be/ad4ESm2AmEw.
Smotek Semi is taking the next step in the development of the CNF-MIM capacitor technology, in technical collaboration with Yageo. And the next generation – Gen-One is expected to deliver a fivefold increase in capacitance density compared to Gen-Zero.
In this interview, Farzan Ghavanini, CTO at Smotek, talks about how Smoltek Semi has developed a new technology generation of our CNF-MIM capacitor technology. The new generation, called Gen-Zero, is the foundation for achieving the goal of manufacturing different types of capacitors with very high capacitance density – by enabling high volumetric capacitance density.