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Smoltek Semi has developed a process for manufacturing of engineering samples in high volumes. This process will now be tested for production of CNF-MIM engineering samples in high volumes, as the first trial-run of capacitor prototypes (without the patent protected carbon nanofibers) was successful.
Smoltek Semi has sucÂcessÂfulÂly manÂuÂfacÂtured capacÂiÂtor proÂtoÂtypes (withÂout carÂbon nanofibers) on 8‑inch wafer forÂmat. The proÂcessÂing has been carÂried out in colÂlabÂoÂraÂtion with sevÂerÂal manÂuÂfacÂturÂing partÂners, includÂing research instiÂtutes, tool venÂdors as well as high-volÂume foundries. Most of the proÂcessÂing has been made on stanÂdard high-volÂume proÂducÂtion tools used for comÂpoÂnent proÂducÂtion in the semiÂconÂducÂtor industry.
The capacÂiÂtor proÂtoÂtypes have the purÂpose of develÂopÂing and valÂiÂdatÂing the staÂbilÂiÂty, repeataÂbilÂiÂty, and overÂall qualÂiÂty of the fabÂriÂcaÂtion processÂes necÂesÂsary for 8‑inch wafer forÂmat proÂducÂtion – not to demonÂstrate high elecÂtriÂcal perÂforÂmance of our CNF-MIM capacitors.
Louise DukÂer, Chief ProdÂuct OffiÂcer at Smoltek Semi.
Based on the sucÂcessÂful results achieved, Smoltek Semi has decidÂed to utiÂlize the develÂoped 8‑inch fabÂriÂcaÂtion process to proÂduce the first lot of CNF-MIM engiÂneerÂing samÂples, incorÂpoÂratÂing Smoltek’s proÂpriÂetary and patent-proÂtectÂed carÂbon nanofibers.
The CNF-MIM engiÂneerÂing samÂples, that are now being manÂuÂfacÂtured in this 8‑inch process are expectÂed by the end of the fourth quarÂter this year. The elecÂtriÂcal perÂforÂmance, reliÂaÂbilÂiÂty and process staÂbilÂiÂty that Smoltek Semi aims to demonÂstrate with these CNF-MIM engiÂneerÂing samÂples will proÂvide inforÂmaÂtion needÂed to take the next step towards a comÂmerÂcial high-perÂformÂing capacÂiÂtor prodÂuct togethÂer with our partÂner YAGEO.
DevelÂopÂment of a more indusÂtriÂal proÂducÂtion process
This process develÂopÂment is imporÂtant for priÂmarÂiÂly two reaÂsons. The first being the sigÂnifÂiÂcant increase in the numÂber of capacÂiÂtors we can proÂduce for develÂopÂment purÂposÂes, approxÂiÂmateÂly 27 000 capacÂiÂtors on one sinÂgle 8‑inch wafer.
The sheer numÂber makes it posÂsiÂble to conÂduct more data-driÂven develÂopÂment, and hence accelÂerÂate the develÂopÂment pace towards a comÂmerÂcial product.
Karl LunÂdahl, COO and Head of R&D at Smoltek Semi.
The secÂond reaÂson why the 8‑inch form facÂtor is imporÂtant is that the forÂmat is comÂpatÂiÂble with high-volÂume production.
We are quite conÂfiÂdent that the 8‑inch wafer forÂmat that we now have migratÂed to in our develÂopÂment will enable us to more effecÂtiveÂly expeÂdite the tech-transÂfer of the fabÂriÂcaÂtion processÂes to a future high-volÂume proÂducÂtion setting.
Karl LunÂdahl, concludes.
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News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
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Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
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Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
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