Smoltek Semi has acquired and com­mis­sioned a plas­ma-enhanced Atom­ic Lay­er Depo­si­tion (ALD) sys­tem in the clean­room of Chalmers MC2 lab­o­ra­to­ry, enabling high-qual­i­ty ALD film deposition.

With this capa­bil­i­ty, Smoltek Semi can now com­plete a full coat­ing cycle with­in a sin­gle day – reduc­ing devel­op­ment time for its CNF-MIM capac­i­tors from up to a month to a sin­gle day.

“By bring­ing ALD in-house, we gain the free­dom to inno­vate and devel­op pro­pri­etary dielec­tric stacks, tai­lored to our tech­nol­o­gy. This is a key step toward build­ing our own intel­lec­tu­al prop­er­ty with­in dielec­tric stacks and strength­en­ing Smoltek’s long-term com­pet­i­tive posi­tion.“
Farzan Gha­vani­ni, CTO of Smoltek

Increas­ing inno­va­tion and accel­er­at­ing time to mar­ket
Until now, Smoltek relied on exter­nal part­ners for ALD coat­ings — a process that slowed down inno­va­tion and added costs. With its new in-house sys­tem, the com­pa­ny can move from idea to pro­to­type faster than ever before, cut­ting devel­op­ment cycles and accel­er­at­ing time to market. 

The invest­ment marks a strate­gic leap for­ward, giv­ing Smoltek full con­trol of its coat­ing process­es and the free­dom to devel­op pro­pri­etary ALD recipes opti­mized for car­bon nanofibers — exper­tise that doesn’t exist any­where else. This posi­tions Smoltek at the fore­front of advanced dielec­tric devel­op­ment and fur­ther strength­ens its grow­ing IP portfolio. 

This new capa­bil­i­ty brings Smoltek one step clos­er to indus­tri­al­iz­ing its CNF-MIM capac­i­tor tech­nol­o­gy. By com­bin­ing full process con­trol with faster devel­op­ment cycles, the com­pa­ny can now move more rapid­ly from inno­va­tion to real-world imple­men­ta­tion — bridg­ing the gap between lab­o­ra­to­ry break­throughs and large-scale manufacturing. 

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Read the offi­cial press release here: Smoltek Semi Brings ALD In-House to Accel­er­ate Inno­va­tion and Short­en Time to Mar­ket.