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Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
The formal signing process of the agreement, enabling low-volume production of Smoltek’s ultra-thin CNF-MIM capacitors, is expected to be completed within days. As part of the collaboration, Smoltek will install and bring up its advanced CVD tool (carbon nanofiber growth tool) at ITRI. This marks the beginning of the industrialization of Smoltek’s technology for ultra-thin capacitors aimed at advanced processor chips.
“The Technical Service Agreement allows us to accelerate our roadmap and engage more closely with potential customers who require early samples of our high-performance, ultra-thin capacitors.”
Farzan Ghavanini, CTO of Smoltek
The technical service agreement ensures that Smoltek gains seamless access to ITRI’s specialized technical competence and engineering resources—an essential step in preparing for commercial deployment. This arrangement allows the company to refine its processes under industrial conditions while leveraging ITRI’s semiconductor R&D environment.
“Smoltek’s innovative CNF-MIM capacitor technology is highly relevant to the semiconductor industry’s drive for greater miniaturization and performance. By combining our advanced R&D infrastructure and engineering expertise with Smoltek’s unique nanotechnology, we aim to accelerate the path toward industrial adoption.”
Dr. Arthur Lin, Division Director at ITRI’s Smart Sensing & Systems Technology Center
Furthermore, the installation and integration of Smoltek’s custom-designed CVD tool at ITRI’s facilities enables a complete and seamless fabrication process to be carried out in one location. This integrated setup is a critical enabler for small-scale production, as it reduces logistics complexity, shortens development cycles, and ensures tighter process control.
“Having our advanced CVD tool on-site at ITRI gives us access to a complete value chain—from material growth to capacitor integration—in a single location. This is a key milestone toward bringing our technology from lab to fab.”
Magnus Andersson, CEO of Smoltek
Smoltek’s patent protected CNF-MIM™ technology enables the fabrication of extremely thin capacitors with high capacitance density. These are ideally suited for integration in the minimal space beneath advanced processor chips—an area where electrical performance and form factor are both critical. This gives Smoltek’s technology a unique competitive advantage for next-generation devices in mobile, AI, and high-performance computing markets.
Read the official press release here: Smoltek and ITRI Initiate Technical Service Agreement for small scale production of CNF-MIM Capacitors.
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