Sign up for our newsletter!
Your data will be handled in compliance with our privacy policy.
Your data will be handled in compliance with our privacy policy.
Dr. Farzan Ghavanini, CTO of Smoltek has been on a week-long business trip to Taiwan to visit some of our collaboration partners for CNF-MIM capacitors, among those ALD-company Skytech.
AtomÂic LayÂer DepoÂsiÂtion (ALD) is a key proÂcessÂing step in conÂvertÂing the excepÂtionÂal surÂface to volÂume ratio offered by carÂbon nanofibers to a high capacÂiÂtance denÂsiÂty CNF-MIM capacitor.
Skytech proÂduces some of the best-in-class ALD tools that offer extreme uniÂforÂmiÂty and film qualÂiÂty over 3D strucÂtures. These qualÂiÂties are vital for Smoltek’s CNF-MIM techÂnolÂoÂgy where high aspect ratio nanofibers must be conÂforÂmalÂly coatÂed with a thin dielecÂtric film.
Farzan GhaÂvaniÂni, CTO at Smoltek
DurÂing the busiÂness trip to TaiÂwan, Dr. Farzan GhaÂvaniÂni sat with Skytech CEO, George Yi, to disÂcuss future colÂlabÂoÂraÂtions and how to inteÂgrate Skytech’s ALD clusÂter tools in CNF-MIM capacÂiÂtor fabÂriÂcaÂtion process flow.
About Skytech
Skytech is a TaiÂwanese comÂpaÂny, based in Hsinchu, that proÂduces state-of-the-art ALD tools, offerÂing excepÂtionÂal film uniÂforÂmiÂty, thickÂness conÂtrol, and mateÂrÂiÂal properties.
PeoÂple picÂtured in the top phoÂto: Farzan GhaÂvaniÂni from Smoltek togethÂer with George Li and co-workÂer from Skytech.
Your data will be handled in compliance with our privacy policy.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.
News
April 28, 2025
Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
News
March 25, 2025
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.