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Last week our awesome and hardworing R&D-team managed to demonstrate CNF-growth on a 200mm silicon wafer in the Chalmers MC2 150mm lab in Gothenburg.
This great achievement opens up for better and simpler prototyping for customers utilizing 200mm production processing.
This great acheivement opens up new methods for better and simpler prototype manufacturing for customers utilizing 200mm production processes.
Your data will be handled in compliance with our privacy policy.
News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.