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During the year Smoltek has installed two new equipment systems for enhancing the R&D work. This will give the company long-term benefits with increased opportunities of technology development and cost efficiency.
Smoltek has invested in a new CVD-system for more effective and versatile growth of carbon nanostructures. The completion of the installation and subsequent commissioning of our new CVD-system to our research lab at Chalmers MC2-building allows us to increase our CNF-MIM R&D capacity, making it possible to produce our CNF-MIM prototype capacitors on 150 mm wafers.
Furthermore, the addition of the new CVD-system provides the necessary redundancy and process reproducibility in order to meet the increasing number of customer requests in terms of proof-of-concept and prototypes. This applies to semiconductors as well as to the development of new technology applications in the field of energy conversion and energy storage (ie. electrolyzers and fuel cells).
R&D engineer Amin Saleem has made the first growth in this new system – a 150 mm wafer filled with CNF-MIM capacitors
New measurement system
Smoltek has also invested in a new measuring instrument system, which provides increased possibilities, not only for measuring and electrically characterizing of different prototypes, but also assess the time and temperature stability and reliability of our devices. The investment will further increase the opportunities and cost efficiency of technology development.
R&D engineer Victor Marknäs characterizing CNF-MIM samples
“We will benefit greatly from this expanded measurement capacity where we can, for example, perform reliability tests and have a more dedicated measurement setup for CNF-MIM capacitors. For all samples we produce, several parameters need to be characterized, such as frequencies, leakage current, voltage dependence, temperature dependence and so on,” says Victor Marknäs, R&D engineer at Smoltek.
Top image: R&D engineers at Chalmers MC2 laboratory
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News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.
News
April 28, 2025
Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
News
March 25, 2025
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.