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Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.
Qi Li and ChinJung Kuo of Smoltek Semi have met with Skytech management in Taiwan for planning of testing dummy runs for ALD deposition of Smoltek's CNF-MIM capacitors.
In an age where environmental sustainability is of utter importance, it is crucial to find innovative solutions to reduce energy consumption and minimize our carbon footprint. One such solution is found in capacitors. These unassuming electronic components not only play an important role in various systems, but also offer significant environmental benefits. Albeit very small – if counted one by one.
Smoltek is awarded an additional patent in the Discrete CNF-MIM patent family. The protected innovation in this patent family discloses a discrete capacitor component based on our CNF-MIM technology. This also brings our IP portfolio to comprise 94 granted patents.
Smoltek has been awarded another patent in the Multilayer Cap patent family. The innovation in this patent family introduces a MIM-capacitor device that can double or triple the capacitance density of our CNF-MIM capacitors.
Modern electronics demand increasingly compact and powerful capacitors, and the race for miniaturization has reached a critical juncture. While both Deep Trench Capacitors (DTC) and Carbon Nanofiber Metal-Insulator-Metal (CNF-MIM) capacitors are being developed for advanced applications requiring smaller size and higher capacitance density than conventional surface-mounted capacitors, DTC pushes the boundaries of what’s achievable with subtractive manufacturing, but is hitting fundamental physical limits. In contrast, Smoltek’s innovative CNF-MIM technology offers a revolutionary path forward, unrestricted by these constraints.
We are pleased to announce that the new zirconia based dielectric stack, previously reported to show 230% improvement in capacitance density, has now passed the 1,000-hour DC life test, a preliminary reliability test, carried out by capacitor manufacturer Yageo.
Dr. Farzan Ghavanini, CTO of Smoltek has been on a week-long business trip to Taiwan to visit some of our collaboration partners for CNF-MIM capacitors, among those ALD-company Skytech.
Smoltek recently visited its Taiwanese partner in advanced microelectronic packaging to discuss the specific requirements for next generations of Smoltek's CNF-MIM (Carbon Nanofiber-Metal Insulator-Metal) capacitors.
Smoltek Semi and Taiwanese Industrial Technology Research Institute (ITRI) are discussing a collaboration to set up a pilot line for fabrication of CNF-MIM capacitors in Taiwan as part of getting ready for mass production.
Interview with Philip Lessner, CTO of Yageo Group about the rapid development in the capacitor industry, the market evolvement and future technology needs for ultra-thin capacitors. And how CNF-MIM technology fits into this market. This is a follow-up to the interview from earlier this year. Yageo remains interested in Smoltek's CNF-MIM capacitors and sees great potential for using CNF-MIM capacitors in their customer offering.