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Smoltek has been awarded another patent in the Multilayer Cap patent family. The innovation in this patent family introduces a MIM-capacitor device that can double or triple the capacitance density of our CNF-MIM capacitors.
The MulÂtiÂlayÂer Cap patent famÂiÂly details an invenÂtion for a layÂered enerÂgy storÂage device, specifÂiÂcalÂly a capacÂiÂtor, built using a metÂal-insuÂlaÂtor-metÂal (MIM) configuration.
This is the secÂond grantÂed patent in this famÂiÂly and the innoÂvaÂtion disÂclosÂes a CNF (carÂbon nanofiber) based mulÂtiÂlayÂer MIM strucÂture in which elecÂtrodes and dielectrics are depositÂed one after anothÂer. This is a techÂnique that has potenÂtial to greatÂly increase the capacÂiÂtance denÂsiÂty and hence is conÂsidÂered imporÂtant for Smoltek busiÂness and technology.
CapacÂiÂtance denÂsiÂty is a key perÂforÂmance indiÂcaÂtor of our CNF-MIM capacÂiÂtor techÂnolÂoÂgy. In this patent famÂiÂly, we introÂduce an innoÂvÂaÂtive mulÂti-layÂer strucÂture that can douÂble or triple the capacÂiÂtance density.
Farzan GhaÂvaniÂni, CTO at Smoltek.
The MulÂtiÂlayÂer Cap patent appliÂcaÂtion includes two indeÂpenÂdent claims: A device claim, that describes the stacked mulÂtiÂlayÂer capacÂiÂtor strucÂture havÂing alterÂnatÂing conÂducÂtor-insuÂlaÂtor layÂers. And a method claim, describÂing the fabÂriÂcaÂtion of such device with conÂforÂmal coatÂing on the CNFs.
Smoltek’s patent portÂfoÂlio now globÂalÂly comÂprisÂes 93 grantÂed patents. Read more about our IP and patents.
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News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.