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Smoltek has been awarded a new patent in the Discrete CNF-MIM patent family. The protected innovation in this patent family discloses a discrete capacitor component based on our CNF-MIM technology. This also brings our IP portfolio to comprise 91 granted patents.
The newly approved US-patent is the fifth in order in the Discrete CNF-MIM patent family. This patent family discloses innovations that exploit the extra ordinary surface to volume ratio provided by carbon nanofibers and proposes a discrete Metal-Insulator-Metal (MIM) structure with unparalleled high capacitance density.
This patent grant further strengthens our IP portfolio in the field of ultra-thin capacitors, which is important for us as the semiconductor industry invests aggressively in advanced capacitor technologies to match the demands of newer integrated circuits.
Farzan Ghavanini, CTO at Smoltek
The Discrete CNF-MIM patent family discloses a high-density discrete capacitor based on Smoltek’s carbon nanofiber technology paving the way for CNF based ultra-thin capacitors that can be placed adjacent to the components they are supposed to support. The patent family enables the system designers to bring forward integration and packaging schemes with superior performance with very small footprint. These new schemes are vital in developing new products in the field of IoT, wearables, high-performance computing (HPC), Artificial Intelligence (AI), and similar.
It is rewarding to witness that our R&D efforts as reflected in our expanding IP portfolio aligns well with the needs of the semiconductor industry and that our disruptive technology can solve problems that traditional technologies cannot, Farzan Ghavanini concludes.
Smoltek’s patent portfolio now globally comprises 91 granted patents. Read more about our IP and patents.
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News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
Media mentions
June 17, 2025
This is a summary of an article featuring Smoltek titled "Smoltek bryter teknisk barriär och efterlyser pengar" published by elektroniktidningen on June 16, 2025.
IR Blog Posts
June 16, 2025
Smoltek Semi joins an elite club of companies achieving 1 µF/mm² capacitance density, but stands alone in reaching this milestone with an ultra-thin profile. This breakthrough unlocks the under-chip real estate that represents the holy grail of capacitor placement in modern electronics.
News
June 12, 2025
Smoltek Hydrogen is developing Smoltek PTE – a proprietary porous transport electrode based on carbon nanostructures, which is intended to meet the requirements of next-generation PEM electrolyzers for the production of fossil-free hydrogen.