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Smoltek has received a new patent for improving the capacitance density of CNF-MIM capacitors
Smoltek has received a new patent for improving the capacitance density of our CNF-MIM capacitors. This innovation, a type of capacitor, can increase the capacitance density by two to three times, which is crucial for Smoltek's business and technology growth.
July 3, 2024
The patent is the first one in a new category called Multilayer Cap, and describes a method for creating a layered capacitor using a metal-insulator-metal (MIM) structure. This method involves stacking conductor-insulator layers to enhance capacitance density, a key feature of Smoltek’s CNF-MIM capacitor technology.
Capacitance density is one of the most important KPIs of our CNF-MIM capacitor technology. In this new patent, we propose a technique that doubles or triples the capacitance density through an innovating multi-layer structure.
Farzan Ghavanini, CTO at Smoltek.
The patent discloses a discrete metal-insulator-metal (MIM) capacitor component based on the proprietary carbon nanofiber technology developed at Smoltek. It also describes the structure of such capacitor and the related microfabrication processes to realize it
The patent includes two main claims: one for the structure of the capacitor and another for the manufacturing process. This invention focuses on improving metal-insulator-metal (MIM) capacitors and batteries, including capacitors and batteries, through a new, innovative multi-layer structure.
Smoltek’s patent portfolio now globally comprises 90 granted patents. Read more about our IP and patents.
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