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Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
Smoltek’s newly approved patent in Korea is the seventh for the Discrete CNF-MIM patent family. Discrete CNF-MIM is an innovation that exploits the extraordinary surface-to-volume ratio enabled by our carbon nanofiber technology.
“This Korean patent further strengthens our position in advanced capacitor technology as the semiconductor industry moves toward ultra-thin capacitors for tighter integration with electronic components with large power consumption footprint.”, says Farzan Ghavanini, CTO at Smoltek.
This Korean patent further strengthens our position in advanced capacitor technology as the semiconductor industry moves toward ultra-thin capacitors for tighter integration with electronic components with large power consumption footprint.
Farzan Ghavanini, CTO at Smoltek.
The Discrete CNF-MIM patents disclose an ultra-thin capacitor technology that could achieve extremely high capacitance densities thanks to unparalleled surface density provided by carbon nanofibers. Such a technology enables advanced integration methodologies bringing the capacitors in the power distribution network as close as possible to the processors, which is crucial in areas like Artificial Intelligence (AI), Internet of Things (IoT), wearable devices, and high-performance computing.

Smoltek’s patent portfolio now globally comprises 95 granted patents. Read more about our IP and patents.
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News
November 20, 2025
We have launched a podcast about materials technology and investments in general and our disruptive carbon nanotechnology in particular.
News
November 17, 2025
Smoltek Semi is currently optimizing the company’s advanced PECVD system to ensure implementation of its most recent technological innovations in CNF synthesis, enabling compliance with stringent customer requirements, prior to installation at ITRI in Taiwan.
News
November 5, 2025
Smoltek Semi has reached an important technical milestone in the development of the company’s carbon fiber-based CNF-MIM technology. The capacitors have successfully passed a 1,000-hour high-temperature durability test, confirming the robustness of the technology for advanced applications.
News
October 24, 2025
Smoltek Semi has acquired a plasma-enhanced Atomic Layer Deposition (ALD) system to implement its advanced dielectric stack on carbon nanofibers. The system will significantly reduce the iteration time of coating processes while enabling innovation and IP generation in dielectric stack technology for carbon nanofiber electrodes.
News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.