The Mul­ti­lay­er Cap patent fam­i­ly details an inven­tion for a lay­ered ener­gy stor­age device, specif­i­cal­ly a capac­i­tor, built using a met­al-insu­la­tor-met­al (MIM) configuration.

With the Mul­ti­lay­er Cap patent fam­i­ly, we are intro­duc­ing an inno­v­a­tive mul­ti-lay­er struc­ture that can dou­ble or triple the capac­i­tance den­si­ty, which is a key per­for­mance indi­ca­tor of our CNF-MIM capac­i­tor technology.

Farzan Gha­vani­ni, CTO at Smoltek.

The patent, grant­ed in Tai­wan is the third grant­ed patent in this fam­i­ly, for the inno­va­tion that dis­clos­es a car­bon nanofiber (CNF) based mul­ti­lay­er MIM struc­ture in which elec­trodes and dielectrics are deposit­ed one after anoth­er. This is a tech­nique that has poten­tial to great­ly increase the capac­i­tance den­si­ty and hence is con­sid­ered impor­tant for Smoltek busi­ness and technology.

The Mul­ti­lay­er Cap patent appli­ca­tion includes two inde­pen­dent claims: A device claim, that describes the stacked mul­ti­lay­er capac­i­tor struc­ture hav­ing alter­nat­ing con­duc­tor-insu­la­tor lay­ers. And a method claim, describ­ing the fab­ri­ca­tion of such device with con­for­mal coat­ing on the CNFs.

Smoltek’s patent port­fo­lio now glob­al­ly com­pris­es 97 grant­ed patents. Read more about our IP and patents.