Sign up for our newsletter!
Your data will be handled in compliance with our privacy policy.
Your data will be handled in compliance with our privacy policy.
Smoltek has yet another patent granted. This time in the US. The patent is related to the Assembly platform patent family in the direction of interconnects. This also makes our patent portfolio to now comprise 65 granted patents.
Smoltek’s 65th patent has been granted in the US and relates to the Assembly platform family, and this particular application is in the field of interconnects and heterogeneous integrations.
Our Assembly platform patent family is a pathway to tap into the ever-increasing demand for miniaturization of electronic components and interconnect them in the form of an assembly to minimize footprint at the packaging level.
“Through this patent grant, we are again showcasing both our technical and innovative capabilities of exploiting our platform technology towards the future”, says Dr Shafiq Kabir, Founder and Chief Innovation Officer at Smoltek.
In the context of Assembly platform and interconnects, the present applications concepts take advantage of the wettability properties of nanostructures to form small sized composite interconnect bumps together with traditional solder/metal materials. Such composite interconnects provide a means to improve the electrical reliability of the solder/metal bumps since carbon nanostructures are inherently capable of carrying high current at a much smaller footprint.
Smoltek’s patent portfolio now globally comprises 65 granted patents. Read more about our IP and patents.
Image: Smoltek R&D engineers at Chalmers MC2 laboratory
Your data will be handled in compliance with our privacy policy.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
News
June 11, 2025
Smoltek Semi develops CNF-MIM – a proprietary capacitor technology based on carbon nanofibers, which is intended to meet the demands of next-generation electronics, including applications in AI, smartphones and automotive electronics.
News
April 28, 2025
Smoltek is awarded yet another patent in the Discrete CNF-MIM patent family. The innovation discloses a discrete capacitor component based on our CNF-MIM technology that can achieve unparalleled high capacitance density. This also brings our IP portfolio to comprise 95 granted patents.
News
March 25, 2025
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.