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Smoltek is awarded a new patent – the first one of a new patent family called Discrete CNF-MIM. This innovation discloses a discrete capacitor component based on our CNF-MIM technology. This also brings our IP portfolio now to comprise 79 granted patents.
This is the first patent in the new patent family of discrete capacitor applications, and the innovation exploits the extra-ordinary surface to volume ratio provided by carbon nanofibers to create a MIM capacitor with unparalleled high capacitance density.
“With this new patent family Smoltek expands its IP portfolio to include the field of discrete capacitors – a field that we have been heavily investing in terms of R&D and innovation resources.”
Farzan Ghavanini, CTO at Smoltek.
The patent discloses a discrete metal-insulator-metal (MIM) capacitor component based on the proprietary carbon nanofiber technology developed at Smoltek. It also describes the structure of such capacitor and the related microfabrication processes to realize it.
“This patent grant has arrived in perfect time as the semiconductor industry has started to investigate aggressively in advanced capacitor technologies to match the demands of newer integrated circuits. It is rewarding to witness that our R&D efforts as reflected in our expanding IP portfolio aligns well with the needs of the industry and that our disruptive technology can solve problems that traditional technologies cannot.”
Farzan Ghavanini
The new Discrete CNF-MIM patent family discloses a high-density discrete capacitor based on Smoltek’s carbon nanofiber technology paving the way for ultra-thin capacitors that can be placed adjacent to the components they are supposed to support. The patent family enables the system designers to bring forward integration and packaging schemes with superior performance with very small footprint. These new schemes are vital in developing new products in the field of IoT, wearables, high-performance computing (HPC), and similar.
Smoltek’s patent portfolio now globally comprises 79 granted patents. Read more about our IP and patents.
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News
October 16, 2025
Smoltek has been awarded another patent in the Multilayer Cap patent family – an innovation that can double or triple the capacitance density of our CNF-MIM capacitors. This is a key factor for Smoltek's business and technology development.
News
September 17, 2025
Smoltek Semi has successfully participated in Semicon Taiwan 2025, invited by their strategic partner ITRI.
News
September 10, 2025
Smoltek Semi is selected by ITRI, as one out of three collaboration partners, to be part of their exhibition stand at Semicon Taiwan 2025. We are grateful to be able to present our ultra-thin CNF-MIM capacitor technology for powering next generation advanced semiconductor chips.
News
June 27, 2025
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
News
June 18, 2025
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
News
June 11, 2025
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.