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Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
Smoltek Semi joins an elite club of companies achieving 1 µF/mm² capacitance density, but stands alone in reaching this milestone with an ultra-thin profile. This breakthrough unlocks the under-chip real estate that represents the holy grail of capacitor placement in modern electronics.
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.
Qi Li and ChinJung Kuo of Smoltek Semi have met with Skytech management in Taiwan for planning of testing dummy runs for ALD deposition of Smoltek's CNF-MIM capacitors.
In an age where environmental sustainability is of utter importance, it is crucial to find innovative solutions to reduce energy consumption and minimize our carbon footprint. One such solution is found in capacitors. These unassuming electronic components not only play an important role in various systems, but also offer significant environmental benefits. Albeit very small – if counted one by one.
Modern electronics demand increasingly compact and powerful capacitors, and the race for miniaturization has reached a critical juncture. While both Deep Trench Capacitors (DTC) and Carbon Nanofiber Metal-Insulator-Metal (CNF-MIM) capacitors are being developed for advanced applications requiring smaller size and higher capacitance density than conventional surface-mounted capacitors, DTC pushes the boundaries of what’s achievable with subtractive manufacturing, but is hitting fundamental physical limits. In contrast, Smoltek’s innovative CNF-MIM technology offers a revolutionary path forward, unrestricted by these constraints.
We are pleased to announce that the new zirconia based dielectric stack, previously reported to show 230% improvement in capacitance density, has now passed the 1,000-hour DC life test, a preliminary reliability test, carried out by capacitor manufacturer Yageo.
Dr. Farzan Ghavanini, CTO of Smoltek has been on a week-long business trip to Taiwan to visit some of our collaboration partners for CNF-MIM capacitors, among those ALD-company Skytech.
Smoltek recently visited its Taiwanese partner in advanced microelectronic packaging to discuss the specific requirements for next generations of Smoltek's CNF-MIM (Carbon Nanofiber-Metal Insulator-Metal) capacitors.
Smoltek Semi and Taiwanese Industrial Technology Research Institute (ITRI) are discussing a collaboration to set up a pilot line for fabrication of CNF-MIM capacitors in Taiwan as part of getting ready for mass production.