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Smoltek Semi has developed a new material for use in CNF-MIM capacitors. The new material increases capacitance by more than three times and reduces leakage current by 50 percent. In this article, we examine what this means and why it is good for shareholders and investors.
Thomas Barregren • October 1, 2024
In a press release, we announced that Smoltek Semi has develÂoped a new dielecÂtric stack that increasÂes capacÂiÂtance denÂsiÂty by 230 perÂcent and reduces leakÂage curÂrent by 50 perÂcent. But what the heck is a dielecÂtric stack? And how does it benÂeÂfit you as a shareÂholdÂer and investor?
CarÂbon nanofibers are the core of what we do. We use them to tackÂle comÂplex mateÂrÂiÂal chalÂlenges across varÂiÂous indusÂtries, such as creÂatÂing ultra-thin capacÂiÂtors with sufÂfiÂcient capacitance.
CapacÂiÂtors are essenÂtial for staÂbiÂlizÂing the powÂer flucÂtuÂaÂtions caused when tranÂsisÂtors inside an appliÂcaÂtion procesÂsor switch between ones and zeros bilÂlions of times per secÂond. They quickÂly absorb excess enerÂgy and release stored enerÂgy when needÂed. The catch is that these capacÂiÂtors must be placed very close to the tranÂsisÂtors to be effective—ideally, right under the chip itself.
This requires capacÂiÂtors small enough to fit between the solÂder balls on the underÂside of the chip. These capacÂiÂtors need to be thinÂner than the diamÂeÂter of the solÂder balls yet still proÂvide enough capacÂiÂtance to hanÂdle the task.
Smoltek Semi addressÂes this chalÂlenge with its CNF-MIM capacitors.
FunÂdaÂmenÂtalÂly, a capacÂiÂtor conÂsists of two metÂal plates with an insuÂlatÂing mateÂrÂiÂal between them. Its abilÂiÂty to store enerÂgy, capacÂiÂtance, is priÂmarÂiÂly deterÂmined by three factors:
CNF-MIM capacÂiÂtors are just metÂal-insuÂlaÂtion-metÂal (MIM) capacÂiÂtors where we creÂate a large area in a small volÂume using carÂbon nanofibers (CNF).
GrowÂing carÂbon nanofibers on a surÂface increasÂes the surÂface area tens of thouÂsands of times. To underÂstand why this is so, conÂsidÂer a carÂbon nanofiber as a verÂtiÂcalÂly standÂing cylinÂder of height h and radius r. The cylinder’s manÂtle surÂface is 2Ï€rh, and its base surÂface is Ï€r2. So you could say that the carÂbon nanofiber takes up a surÂface of Ï€r2 but creÂates a new surÂface of 2Ï€rh. Since h is much largÂer than r, the new surÂface is also much largÂer, more preÂciseÂly 2Ï€rh /​ Ï€r2 = 2h/​r. A carÂbon nanofiber with r = 20 nm and h = 20 µm thus increasÂes the area by a whopÂping facÂtor of 1,000.
It is this capacÂiÂty, as an area mulÂtiÂpliÂer, that carÂbon nanofiber is used in Smoltelk’s CNF-MIM capacÂiÂtor. They mulÂtiÂply the surÂface area, which we then covÂer layÂer by layÂer with metÂal, insuÂlaÂtion, and more metal.
SimÂply put, we start with a subÂstrate on which we grow a forÂest of carÂbon nanofibers. Each carÂbon nanofiber is then coatÂed in metÂal. Next, we add a layÂer of insuÂlaÂtion over the metÂal-coatÂed nanofibers. FinalÂly, we place anothÂer metÂal layÂer on top of the insuÂlaÂtion. This creÂates a large metÂal-insuÂlaÂtion-metÂal surÂface area relÂaÂtive to its small volume.
Because a capacitor’s abilÂiÂty to store enerÂgy is proÂporÂtionÂal to its surÂface area, the capacÂiÂtance per unit volÂume of CNF-MIM capacÂiÂtors is extremeÂly high. This allowed Smoltek to showÂcase a lab proÂtoÂtype of the world’s thinnest capacÂiÂtor already in 2021.

HafniÂum oxide was used as insuÂlaÂtion in the first batchÂes of CNF-MIM capacÂiÂtors. HafniÂum oxide is a mateÂrÂiÂal with high dielecÂtric conÂstant κ.
What the press release says is that Smoltek Semi’s researchers have develÂoped a brand new insuÂlaÂtion that alone increasÂes capacÂiÂtance denÂsiÂty by 230 perÂcent comÂpared to hafniÂum oxide.
On the same surÂface area as before, we can now get more than three times the capacÂiÂtance. This means that Smoltek puts furÂther disÂtance between itself and its competitors.
MoreÂover, as icing on the cake, Smoltek’s engiÂneers have reduced the inevitable leakÂage curÂrent by 50 percent.
The new insuÂlaÂtion conÂsists of layÂer upon layÂer of two mateÂriÂals. One mateÂrÂiÂal has a very high dielecÂtric conÂstant κ, which means it can store a lot of enerÂgy. The othÂer mateÂrÂiÂal is a very good elecÂtriÂcal insuÂlaÂtor, which means it acts as a barÂriÂer to leakÂage current.
We call the new mateÂrÂiÂal a dielecÂtric stack, because it is a stack of layÂers of the two mateÂriÂals, and it has a high dielecÂtric conÂstant κ.
To betÂter underÂstand the propÂerÂties of the new dielecÂtric stack, we began by using it in the simÂplest type of capacÂiÂtors: parÂalÂlel plate capacÂiÂtors. As the name sugÂgests, these conÂsist of two parÂalÂlel metÂal plates with the dielecÂtric stack between them. This design lets us study the dielecÂtric stack’s charÂacÂterÂisÂtics withÂout interÂferÂence from othÂer factors.
We have manÂuÂfacÂtured these capacÂiÂtors and sent them to Yageo for reliÂaÂbilÂiÂty testÂing and furÂther charÂacÂterÂiÂzaÂtion. MeanÂwhile, we’ve already moved on to the next phase: inteÂgratÂing the new dielecÂtric stack into CNF-MIM capacitors.
As Yageo carÂries out its testÂing and the first CNF-MIM capacÂiÂtors are proÂduced using the new dielecÂtric stack, Smoltek’s CTO, Farzan GhaÂvaniÂni, reviews the iniÂtial results with satÂisÂfacÂtion and enthuÂsiÂasm. With a 230 perÂcent increase in capacÂiÂtance, a 50 perÂcent reducÂtion in leakÂage curÂrent, and a flawÂless 100 perÂcent fabÂriÂcaÂtion yield, he is genÂuineÂly thrilled by this breakthrough.
So, what does this mean for you as a shareÂholdÂer and investor?
This means that Smoltek is not just keepÂing up in a comÂpetÂiÂtive indusÂtry but also activeÂly pulling ahead. With a 230 perÂcent increase in capacÂiÂtance and a 50 perÂcent reducÂtion in leakÂage curÂrent, Smoltek has set a new benchÂmark in perÂforÂmance. This breakÂthrough strengthÂens our marÂket posiÂtion and makes our techÂnolÂoÂgy even more attracÂtive to major playÂers in the semiÂconÂducÂtor indusÂtry. It’s not just a techÂniÂcal achievement—it’s a comÂmerÂcial advanÂtage that could lead to new partÂnerÂships and a faster path to marÂket adoption.
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