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Smoltek Semi
Industrial Standard in Thermal and Voltage Stability in CNF-MIM Capacitor Technology
Smoltek Semi has cleared a significant milestone in the development of next-generation CNF-MIM capacitors. Samples from the latest prototype generation, fabricated with an advanced dielectric stack composed of zirconium oxide (ZrO₂) and aluminum oxide (Al₂O₃) have demonstrated exceptional stability under both temperature and voltage stress.
Smoltek and ITRI Goes for Small Scale Production of CNF-MIM Capacitors
Smoltek Semi has initiated the signing of a technical service agreement with the Taiwanese Industrial Technology Research Institute (ITRI) that enables low-volume production of Smoltek's propriety CNF-MIM capacitors.
Major technological milestone in CNF-MIM capacitor development
Smoltek Semi has successfully engineered an advanced dielectric stack that surpasses 1 microfarad per Square millimeter capacitance milestone.
Smoltek nears pilot production of CNF-MIM capacitors
Smoltek Semi and the Taiwanese Industrial Technology Research Institute (ITRI) have finalized the technical framework for the establishment of a pilot production line for Smoltek's CNF-MIM capacitors at ITRI.
Smoltek and Taiwanese Skytech in demo planning
Qi Li and ChinJung Kuo of Smoltek Semi have met with Skytech management in Taiwan for planning of testing dummy runs for ALD deposition of Smoltek's CNF-MIM capacitors.
Smoltek’s zirconia based dielectric stack passes preliminary 1,000-hour reliability test
We are pleased to announce that the new zirconia based dielectric stack, previously reported to show 230% improvement in capacitance density, has now passed the 1,000-hour DC life test, a preliminary reliability test, carried out by capacitor manufacturer Yageo.
Smoltek and Taiwanese Skytech discuss future collaboration
Dr. Farzan Ghavanini, CTO of Smoltek has been on a week-long business trip to Taiwan to visit some of our collaboration partners for CNF-MIM capacitors, among those ALD-company Skytech.
Smoltek are in discussions about packaging requirements for CNF-MIM capacitors
Smoltek recently visited its Taiwanese partner in advanced microelectronic packaging to discuss the specific requirements for next generations of Smoltek's CNF-MIM (Carbon Nanofiber-Metal Insulator-Metal) capacitors.
Smoltek is getting ready for pilot production of CNF-MIM capacitors
Smoltek Semi and Taiwanese Industrial Technology Research Institute (ITRI) are discussing a collaboration to set up a pilot line for fabrication of CNF-MIM capacitors in Taiwan as part of getting ready for mass production.
Smoltek accelerates the device prototyping process
Smoltek Semi has developed a new process, known as zapping, that reduces the number of steps required to manufacture test capacitors.
New method accelerates CNF-MIM development
Our innovative “zapping” method drastically reduces development time and costs, enabling us to advance CNF-MIM technology faster and making Smoltek Semi’s technology even more attractive to potential buyers. Read on to see how this new process strengthens our position and shortens our path to market.
New dielectric stack for CNF-MIM capacitors boost capacitance density by 230%
Smoltek Semi has spent the last nine months working intensively on a project to develop a new dielectric stack for the CNF-MIM capacitor technology resulting in a 230% boost in capacitance density.