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Wo2021211038a1 Multilayer Cap

Multilayer Cap

The Multilayer Cap patent family introduces a MIM-capacitor device that can double or triple the capacitance density of Smoltek's CNF-MIM capacitors. The patent details an invention for a layered energy storage device, specifically a capacitor, built using a metal-insulator-metal (MIM) configuration.
Read moreMultilayer Cap
Smoltek Patent 85 Website Image

Contact Resistance

The Contact Resistance patent family is covering how to improve a separator plate arrangement for an electrochemical cell by comprising a nanostructure which offers lowered contact resistance between the separator element and the diffusion layer.
Read moreContact Resistance